Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD

Hot-Wire Chemical Vapor Deposition has led to microcrystalline silicon solar cell efficiencies similar to those obtained with Plasma Enhanced CVD. The light-induced degradation behavior of microcrystalline silicon solar cells critically depends on the properties of their active layer. In the regime...

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Authors: Fonrodona Turon, Marta; Soler Vilamitjana, David; Villar, Fernando; Escarré i Palou, Jordi; Asensi López, José Miguel; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi
Format: Article
Status:Accepted version
Publication date:2006
Country:España
Institution:Universidad de Barcelona
Repository:Dipòsit Digital de la UB
OAI Identifier:oai:diposit.ub.edu:2445/47300
Online Access:https://hdl.handle.net/2445/47300
Access Level:Open access
Keyword:Cèl·lules solars
Silici
Deposició química en fase vapor
Energia solar
Solar cells
Silicon
Chemical vapor deposition
Solar energy
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author Fonrodona Turon, Marta
author2 Soler Vilamitjana, David
Villar, Fernando
Escarré i Palou, Jordi
Asensi López, José Miguel
Bertomeu i Balagueró, Joan
Andreu i Batallé, Jordi
author2_role author
author
author
author
author
author
author_browse Andreu i Batallé, Jordi
Asensi López, José Miguel
Bertomeu i Balagueró, Joan
Escarré i Palou, Jordi
Fonrodona Turon, Marta
Soler Vilamitjana, David
Villar, Fernando
author_facet Fonrodona Turon, Marta
Soler Vilamitjana, David
Villar, Fernando
Escarré i Palou, Jordi
Asensi López, José Miguel
Bertomeu i Balagueró, Joan
Andreu i Batallé, Jordi
author_role author
collection Dipòsit Digital de la UB
description Hot-Wire Chemical Vapor Deposition has led to microcrystalline silicon solar cell efficiencies similar to those obtained with Plasma Enhanced CVD. The light-induced degradation behavior of microcrystalline silicon solar cells critically depends on the properties of their active layer. In the regime close to the transition to amorphous growth (around 60% of amorphous volume fraction), cells incorporating an intrinsic layer with slightly higher crystalline fraction and [220] preferential orientation are stable after more than 7000 h of AM1.5 light soaking. On the contrary, solar cells whose intrinsic layer has a slightly lower crystalline fraction and random or [111] preferential orientation exhibit clear light-induced degradation effects. A revision of the efficiencies of Hot-Wire deposited microcrystalline silicon solar cells is presented and the potential efficiency of this technology is also evaluated.
eu_rights_str_mv openAccess
format article
id ES_c87b0a633d8caef0c48de92e2c8dc17a
institution Universidad de Barcelona
instname_str Universidad de Barcelona
network_acronym_str ES
network_name_str España
oai_identifier_str oai:diposit.ub.edu:2445/47300
publishDate 2006
publishDateSort 2006
publisher Elsevier B.V.
publisherStr Elsevier B.V.
reponame_str Dipòsit Digital de la UB
spelling Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD Fonrodona Turon, Marta Soler Vilamitjana, David Villar, Fernando Escarré i Palou, Jordi Asensi López, José Miguel Bertomeu i Balagueró, Joan Andreu i Batallé, Jordi Cèl·lules solars Silici Deposició química en fase vapor Energia solar Solar cells Silicon Chemical vapor deposition Solar energy Hot-Wire Chemical Vapor Deposition has led to microcrystalline silicon solar cell efficiencies similar to those obtained with Plasma Enhanced CVD. The light-induced degradation behavior of microcrystalline silicon solar cells critically depends on the properties of their active layer. In the regime close to the transition to amorphous growth (around 60% of amorphous volume fraction), cells incorporating an intrinsic layer with slightly higher crystalline fraction and [220] preferential orientation are stable after more than 7000 h of AM1.5 light soaking. On the contrary, solar cells whose intrinsic layer has a slightly lower crystalline fraction and random or [111] preferential orientation exhibit clear light-induced degradation effects. A revision of the efficiencies of Hot-Wire deposited microcrystalline silicon solar cells is presented and the potential efficiency of this technology is also evaluated. Elsevier B.V. https://hdl.handle.net/2445/47300
spellingShingle Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD
Fonrodona Turon, Marta
Cèl·lules solars
Silici
Deposició química en fase vapor
Energia solar
Solar cells
Silicon
Chemical vapor deposition
Solar energy
status_str acceptedVersion
title Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD
title_full Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD
title_fullStr Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD
title_full_unstemmed Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD
title_short Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD
title_sort Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD
topic Cèl·lules solars
Silici
Deposició química en fase vapor
Energia solar
Solar cells
Silicon
Chemical vapor deposition
Solar energy
topic_facet Cèl·lules solars
Silici
Deposició química en fase vapor
Energia solar
Solar cells
Silicon
Chemical vapor deposition
Solar energy
url https://hdl.handle.net/2445/47300