An upgraded drift-diffusion model for evaluating the carrier lifetimes in radiation-damaged semiconductor detectors

The transport properties of a series of n- and p-type Si diodes have been studied by the Ion Beam Induced Charge (IBIC) technique using a 4 MeV proton microbeam. The samples were irradiated with 17 MeV protons at fluences ranging from 1x1012 to 1x1013 p/cm2 in order to produce a uniform profile of d...

Full description

Bibliographic Details
Authors: García López, Francisco Javier; Jiménez Ramos, María del Carmen; Rodríguez Ramos, Mauricio; Forneris, Jacopo; Ceballos, Joaquín
Format: Article
Status:Accepted version
Publication date:2016
Country:España
Institution:Universidad de Sevilla (US)
Repository:idUS. Depósito de Investigación de la Universidad de Sevilla
OAI Identifier:oai:idus.us.es:11441/166771
Online Access:https://hdl.handle.net/11441/166771
https://doi.org/10.1016/j.nimb.2015.09.012
Access Level:Open access
Keyword:Drift-diffusion model
semiconductor detector
Ion beam induced charge
Monte Carlo method.
_version_ 1878735540514193408
author García López, Francisco Javier
author2 Jiménez Ramos, María del Carmen
Rodríguez Ramos, Mauricio
Forneris, Jacopo
Ceballos, Joaquín
author2_role author
author
author
author
author_browse Ceballos, Joaquín
Forneris, Jacopo
García López, Francisco Javier
Jiménez Ramos, María del Carmen
Rodríguez Ramos, Mauricio
author_facet García López, Francisco Javier
Jiménez Ramos, María del Carmen
Rodríguez Ramos, Mauricio
Forneris, Jacopo
Ceballos, Joaquín
author_role author
collection idUS. Depósito de Investigación de la Universidad de Sevilla
description The transport properties of a series of n- and p-type Si diodes have been studied by the Ion Beam Induced Charge (IBIC) technique using a 4 MeV proton microbeam. The samples were irradiated with 17 MeV protons at fluences ranging from 1x1012 to 1x1013 p/cm2 in order to produce a uniform profile of defects with depth. The analysis of the charge collection efficiency (CCE) as a function of the reverse bias voltage has been carried out using an upgraded drift-diffusion (D-D) model which takes into account the possibility of carrier recombination not only in the neutral substrate, as the simple D-D model assumes, but also within the depletion region. This new approach for calculating the CCE is fundamental when the drift length of carriers cannot be considered as much greater that the thickness of the detector due to the ion induced damage. From our simulations, we have obtained the values of the carrier lifetimes for the pristine and irradiated diodes, which have allowed us to calculate the effective trapping cross sections using the one dimension Shockley-Read-Hall model. The results of our calculations have been compared to the data obtained using a recently developed Monte Carlo code for the simulation of IBIC analysis, based on the probabilistic interpretation of the excess carrier continuity equations.
eu_rights_str_mv openAccess
format article
id ES_7eb97074cf27084e7ddc2b0f68402df3
institution Universidad de Sevilla (US)
instname_str Universidad de Sevilla (US)
network_acronym_str ES
network_name_str España
oai_identifier_str oai:idus.us.es:11441/166771
publishDate 2016
publishDateSort 2016
publisher Elsevier
publisherStr Elsevier
reponame_str idUS. Depósito de Investigación de la Universidad de Sevilla
spelling An upgraded drift-diffusion model for evaluating the carrier lifetimes in radiation-damaged semiconductor detectors García López, Francisco Javier Jiménez Ramos, María del Carmen Rodríguez Ramos, Mauricio Forneris, Jacopo Ceballos, Joaquín Drift-diffusion model semiconductor detector Ion beam induced charge Monte Carlo method. The transport properties of a series of n- and p-type Si diodes have been studied by the Ion Beam Induced Charge (IBIC) technique using a 4 MeV proton microbeam. The samples were irradiated with 17 MeV protons at fluences ranging from 1x1012 to 1x1013 p/cm2 in order to produce a uniform profile of defects with depth. The analysis of the charge collection efficiency (CCE) as a function of the reverse bias voltage has been carried out using an upgraded drift-diffusion (D-D) model which takes into account the possibility of carrier recombination not only in the neutral substrate, as the simple D-D model assumes, but also within the depletion region. This new approach for calculating the CCE is fundamental when the drift length of carriers cannot be considered as much greater that the thickness of the detector due to the ion induced damage. From our simulations, we have obtained the values of the carrier lifetimes for the pristine and irradiated diodes, which have allowed us to calculate the effective trapping cross sections using the one dimension Shockley-Read-Hall model. The results of our calculations have been compared to the data obtained using a recently developed Monte Carlo code for the simulation of IBIC analysis, based on the probabilistic interpretation of the excess carrier continuity equations. Elsevier https://hdl.handle.net/11441/166771 https://doi.org/10.1016/j.nimb.2015.09.012
spellingShingle An upgraded drift-diffusion model for evaluating the carrier lifetimes in radiation-damaged semiconductor detectors
García López, Francisco Javier
Drift-diffusion model
semiconductor detector
Ion beam induced charge
Monte Carlo method.
status_str acceptedVersion
title An upgraded drift-diffusion model for evaluating the carrier lifetimes in radiation-damaged semiconductor detectors
title_full An upgraded drift-diffusion model for evaluating the carrier lifetimes in radiation-damaged semiconductor detectors
title_fullStr An upgraded drift-diffusion model for evaluating the carrier lifetimes in radiation-damaged semiconductor detectors
title_full_unstemmed An upgraded drift-diffusion model for evaluating the carrier lifetimes in radiation-damaged semiconductor detectors
title_short An upgraded drift-diffusion model for evaluating the carrier lifetimes in radiation-damaged semiconductor detectors
title_sort An upgraded drift-diffusion model for evaluating the carrier lifetimes in radiation-damaged semiconductor detectors
topic Drift-diffusion model
semiconductor detector
Ion beam induced charge
Monte Carlo method.
topic_facet Drift-diffusion model
semiconductor detector
Ion beam induced charge
Monte Carlo method.
url https://hdl.handle.net/11441/166771
https://doi.org/10.1016/j.nimb.2015.09.012