Enhancing charge extraction in BiVO4 photoanodes by ZrCl4 treatment of SnO2 hole-blocking layers

In the search for more efficient and sustainable photoelectrochemical devices, BiVO4 is nowadays one of the best-performing photoanode material, with favourable band structure for water oxidation. However, BiVO4 photoanodes face challenges such as poor charge transport and slow kinetics. To address...

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Authors: Gacha Mendoza, Valentina; Ros Figueras, Carles; García de Andrés, Xènia|||0000-0003-0795-4168; Llorca, Jordi; Martorell Pena, Jordi|||0000-0002-8762-1162; Raptis, Dimitrios
Format: Article
Publication date:2024
Country:España
Institution:Universitat Politècnica de Catalunya (UPC)
Repository:UPCommons. Portal del coneixement obert de la UPC
Language:English
OAI Identifier:oai:upcommons.upc.edu:2117/415915
Online Access:https://hdl.handle.net/2117/415915
https://dx.doi.org/10.1016/j.apmt.2024.102415
Access Level:Open access
Keyword:BiVO4 Photoanodes
SnO2
ZrCl4
Metal oxidation treatment
Water splitting
Àrees temàtiques de la UPC::Enginyeria química::Química física::Electroquímica
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author Gacha Mendoza, Valentina
author2 Ros Figueras, Carles
García de Andrés, Xènia|||0000-0003-0795-4168
Llorca, Jordi
Martorell Pena, Jordi|||0000-0002-8762-1162
Raptis, Dimitrios
author2_role author
author
author
author
author
author_browse Gacha Mendoza, Valentina
García de Andrés, Xènia|||0000-0003-0795-4168
Llorca, Jordi
Martorell Pena, Jordi|||0000-0002-8762-1162
Raptis, Dimitrios
Ros Figueras, Carles
author_facet Gacha Mendoza, Valentina
Ros Figueras, Carles
García de Andrés, Xènia|||0000-0003-0795-4168
Llorca, Jordi
Martorell Pena, Jordi|||0000-0002-8762-1162
Raptis, Dimitrios
author_role author
collection UPCommons. Portal del coneixement obert de la UPC
description In the search for more efficient and sustainable photoelectrochemical devices, BiVO4 is nowadays one of the best-performing photoanode material, with favourable band structure for water oxidation. However, BiVO4 photoanodes face challenges such as poor charge transport and slow kinetics. To address these issues, SnO2 films are commonly used as hole blocking layers, reducing recombination rate and enhancing charge lifespan and overall productivity. Yet, this method encounters problems like high defect concentrations at the SnO2/BiVO4 interface and pinholes in the SnO2 layer, which lead to charge recombination. In this study, we explore a ZrCl4 treatment to improve the effectiveness of SnO2 as a hole-blocking layer in BiVO4 photoanodes. Our findings, supported by detailed optoelectronic characterization and continuous and modulated electrochemical analysis, reveal that ZrCl4 treatment significantly enhances the hole-blocking properties of SnO2. This treatment results in a 37 % increase in photocurrent density at 1.23 VRHE and a 40 mV shift in the onset voltage, demonstrating a substantial improvement in overall photoanode efficiency.
eu_rights_str_mv openAccess
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institution Universitat Politècnica de Catalunya (UPC)
instname_str Universitat Politècnica de Catalunya (UPC)
language eng
network_acronym_str ES
network_name_str España
oai_identifier_str oai:upcommons.upc.edu:2117/415915
publishDate 2024
publishDateSort 2024
publisher Elsevier
publisherStr Elsevier
reponame_str UPCommons. Portal del coneixement obert de la UPC
spelling Enhancing charge extraction in BiVO4 photoanodes by ZrCl4 treatment of SnO2 hole-blocking layers Gacha Mendoza, Valentina Ros Figueras, Carles García de Andrés, Xènia|||0000-0003-0795-4168 Llorca, Jordi Martorell Pena, Jordi|||0000-0002-8762-1162 Raptis, Dimitrios BiVO4 Photoanodes SnO2 ZrCl4 Metal oxidation treatment Water splitting Àrees temàtiques de la UPC::Enginyeria química::Química física::Electroquímica In the search for more efficient and sustainable photoelectrochemical devices, BiVO4 is nowadays one of the best-performing photoanode material, with favourable band structure for water oxidation. However, BiVO4 photoanodes face challenges such as poor charge transport and slow kinetics. To address these issues, SnO2 films are commonly used as hole blocking layers, reducing recombination rate and enhancing charge lifespan and overall productivity. Yet, this method encounters problems like high defect concentrations at the SnO2/BiVO4 interface and pinholes in the SnO2 layer, which lead to charge recombination. In this study, we explore a ZrCl4 treatment to improve the effectiveness of SnO2 as a hole-blocking layer in BiVO4 photoanodes. Our findings, supported by detailed optoelectronic characterization and continuous and modulated electrochemical analysis, reveal that ZrCl4 treatment significantly enhances the hole-blocking properties of SnO2. This treatment results in a 37 % increase in photocurrent density at 1.23 VRHE and a 40 mV shift in the onset voltage, demonstrating a substantial improvement in overall photoanode efficiency. Peer Reviewed Elsevier https://hdl.handle.net/2117/415915 https://dx.doi.org/10.1016/j.apmt.2024.102415
spellingShingle Enhancing charge extraction in BiVO4 photoanodes by ZrCl4 treatment of SnO2 hole-blocking layers
Gacha Mendoza, Valentina
BiVO4 Photoanodes
SnO2
ZrCl4
Metal oxidation treatment
Water splitting
Àrees temàtiques de la UPC::Enginyeria química::Química física::Electroquímica
title Enhancing charge extraction in BiVO4 photoanodes by ZrCl4 treatment of SnO2 hole-blocking layers
title_full Enhancing charge extraction in BiVO4 photoanodes by ZrCl4 treatment of SnO2 hole-blocking layers
title_fullStr Enhancing charge extraction in BiVO4 photoanodes by ZrCl4 treatment of SnO2 hole-blocking layers
title_full_unstemmed Enhancing charge extraction in BiVO4 photoanodes by ZrCl4 treatment of SnO2 hole-blocking layers
title_short Enhancing charge extraction in BiVO4 photoanodes by ZrCl4 treatment of SnO2 hole-blocking layers
title_sort Enhancing charge extraction in BiVO4 photoanodes by ZrCl4 treatment of SnO2 hole-blocking layers
topic BiVO4 Photoanodes
SnO2
ZrCl4
Metal oxidation treatment
Water splitting
Àrees temàtiques de la UPC::Enginyeria química::Química física::Electroquímica
topic_facet BiVO4 Photoanodes
SnO2
ZrCl4
Metal oxidation treatment
Water splitting
Àrees temàtiques de la UPC::Enginyeria química::Química física::Electroquímica
url https://hdl.handle.net/2117/415915
https://dx.doi.org/10.1016/j.apmt.2024.102415